Omnidirectional and Broadband Antireflection Effect with Tapered Silicon Nanostructures Fabricated with Low-Cost and Large-Area Capable Nanosphere Lithography

In this report, we present a process for the fabrication and tapering of a silicon (Si) nanopillar (NP) array on a large Si surface area wafer (2-inch diameter) to provide enhanced light harvesting for Si solar cell application. From our <i>N</i>,<i>N</i>-dimethyl-formamide (DMF) solvent-controlled...

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Detalles Bibliográficos

Principais autores:	Sangho Kim, Gwan Seung Jeong, Na Yeon Park, Jea-Young Choi
Formato:	Artigo
Idioma:	Inglês
Publicado:	MDPI AG 2021-01-01
Series:	Micromachines
Assuntos:	nanostructure gradient refractive index change antireflection spin-coating solar cell
Acceso en liña:	https://www.mdpi.com/2072-666X/12/2/119
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