Ligand Functionality-Dependent Performance of Organotin Carboxylate Resists

As metal-containing resists attract increasing research interest in high-resolution lithography, gaining insights into the photochemical mechanisms, particularly in relation to the ligand functionality, is actively demanded. In this work, a controlled pair of organotin carboxylates with analogous st...

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Bibliografiska uppgifter

Huvudupphov:	Xiaofei Liu, Tianren Liu, Kaixin Su, Jingxin Lei, Yuanfu Chen, Yuan Chen, Dongxu Yang
Materialtyp:	Artigo
Språk:	Inglês
Utgiven:	MDPI AG 2025-12-01
Serie:	Micromachines
Ämnen:	metal-containing resist deep-ultraviolet lithography organotin carboxylate radical-mediated reaction pattern transfer
Länkar:	https://www.mdpi.com/2072-666X/17/1/1
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