Ligand Functionality-Dependent Performance of Organotin Carboxylate Resists

As metal-containing resists attract increasing research interest in high-resolution lithography, gaining insights into the photochemical mechanisms, particularly in relation to the ligand functionality, is actively demanded. In this work, a controlled pair of organotin carboxylates with analogous st...

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Principais autores:	Xiaofei Liu, Tianren Liu, Kaixin Su, Jingxin Lei, Yuanfu Chen, Yuan Chen, Dongxu Yang
格式:	Artigo
語言:	Inglês
出版:	MDPI AG 2025-12-01
叢編:	Micromachines
主題:	metal-containing resist deep-ultraviolet lithography organotin carboxylate radical-mediated reaction pattern transfer
在線閱讀:	https://www.mdpi.com/2072-666X/17/1/1
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