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Stitch-Less Lithography Empowered by Multi-Dimensional Holography

Trends in Micro- and Nano-Lithography required for future development of large area applications ranging from high-packing-density electronics to solar cells are surveyed and outlined. Strategies to use direct laser writing to define etch masks over large areas by: (i) fixed beam moving stage and (i...

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Autori principali: Hsin-Hui Huang, Haoran Mu, Eulalia Puig Vilardell, Vijayakumar Anand, Darius Gailevičius, Saulius Juodkazis
Natura: Artigo
Lingua:Inglês
Pubblicazione: MDPI AG 2026-06-01
Serie:Nanomaterials
Soggetti:
stitching-less lithography
resolution
feature size
threshold effect
diffraction limit
microfabrication
Accesso online:https://www.mdpi.com/2079-4991/16/11/692
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