Stitch-Less Lithography Empowered by Multi-Dimensional Holography

Trends in Micro- and Nano-Lithography required for future development of large area applications ranging from high-packing-density electronics to solar cells are surveyed and outlined. Strategies to use direct laser writing to define etch masks over large areas by: (i) fixed beam moving stage and (i...

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主要な著者:	Hsin-Hui Huang, Haoran Mu, Eulalia Puig Vilardell, Vijayakumar Anand, Darius Gailevičius, Saulius Juodkazis
フォーマット:	Artigo
言語:	Inglês
出版事項:	MDPI AG 2026-06-01
シリーズ:	Nanomaterials
主題:	stitching-less lithography resolution feature size threshold effect diffraction limit microfabrication
オンライン･アクセス:	https://www.mdpi.com/2079-4991/16/11/692
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