Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes
In this paper a study of the anisotropic dissolution of (hk0) and (hhl) silicon plates in a NaOH 35% solution is undertaken. Effects of orientation on firstly, the geometrical features of etched surfaces and secondly, on the cross-sectional shape of starting circular plates are systematically invest...
Αποθηκεύτηκε σε:
| Κύριοι συγγραφείς: | , |
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| Μορφή: | Artigo |
| Γλώσσα: | Inglês |
| Έκδοση: |
Wiley
2001-01-01
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| Σειρά: | Active and Passive Electronic Components |
| Θέματα: | |
| Διαθέσιμο Online: | http://dx.doi.org/10.1155/2001/80453 |
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