Some Investigations on the Anisotropy of the Chemical Etching of (hk0) and (hhl) Silicon Plates in a NaOH 35% Solution. Part I: 2D Etching Shapes
In this paper a study of the anisotropic dissolution of (hk0) and (hhl) silicon plates in a NaOH 35% solution is undertaken. Effects of orientation on firstly, the geometrical features of etched surfaces and secondly, on the cross-sectional shape of starting circular plates are systematically invest...
Gorde:
| Egile Nagusiak: | , |
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| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
Wiley
2001-01-01
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| Saila: | Active and Passive Electronic Components |
| Gaiak: | |
| Sarrera elektronikoa: | http://dx.doi.org/10.1155/2001/80453 |
| Etiketak: |
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