Fabrication of carbon nanomembranes by helium ion beam lithography
The irradiation-induced cross-linking of aromatic self-assembled monolayers (SAMs) is a universal method for the fabrication of ultrathin carbon nanomembranes (CNMs). Here we demonstrate the cross-linking of aromatic SAMs due to exposure to helium ions. The distinction of cross-linked from non-cross...
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| Hlavní autoři: | , , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Beilstein-Institut
2014-02-01
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| Edice: | Beilstein Journal of Nanotechnology |
| Témata: | |
| On-line přístup: | https://doi.org/10.3762/bjnano.5.20 |
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