Nano- to atomic-scale epitaxial aluminum films on Si substrate grown by molecular beam epitaxy
We demonstrate nano- to atomic-scale epitaxial aluminum film growth on Si(111) substrate by molecular beam epitaxy. Excellent quality of these aluminum films, including sub-nanometer surface roughness, narrow linewidth of X-ray diffraction peak, clear transmission electron diffraction, and high opti...
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| Autori principali: | , , , , , |
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| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
AIP Publishing LLC
2019-10-01
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| Serie: | AIP Advances |
| Accesso online: | http://dx.doi.org/10.1063/1.5116044 |
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