Fabrication of Highly Resistive NiO Thin Films for Nanoelectronic Applications

Abstract Thin films of the prototypical charge transfer insulator nickel oxide appear to be a promising material for novel nanoelectronic devices. The fabrication of the material is challenging, however, and mostly a p‐type semiconducting phase is reported. Here, the results of a factorial experimen...

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Bibliografske podrobnosti

Principais autores:	Johannes Mohr, Tyler Hennen, Daniel Bedau, Joyeeta Nag, Rainer Waser, Dirk J. Wouters
Format:	Artigo
Jezik:	Inglês
Izdano:	Wiley-VCH 2022-12-01
Serija:	Advanced Physics Research
Teme:	charge transfer insulators cluster analysis factorial DOE NiO sputter deposition
Online dostop:	https://doi.org/10.1002/apxr.202200008
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