Plasma source of charged particles for the formation of combined ion-electron beams
One of the ways to increase the efficiency of the implementation of ion-plasma technologies of exposure to the surfaces of various materials is partial or full compensation of the positive charge of ions in the stream or on the treated surface, for which additional emitting systems are used that cre...
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| Главные авторы: | , , , |
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| Формат: | Artigo |
| Язык: | Russo |
| Опубликовано: |
National Academy of Sciences of Belarus
2020-10-01
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| Серии: | Весці Нацыянальнай акадэміі навук Беларусі: Серыя фізіка-тэхнічных навук |
| Предметы: | |
| Online-ссылка: | https://vestift.belnauka.by/jour/article/view/612 |
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