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Plasma source of charged particles for the formation of combined ion-electron beams

One of the ways to increase the efficiency of the implementation of ion-plasma technologies of exposure to the surfaces of various materials is partial or full compensation of the positive charge of ions in the stream or on the treated surface, for which additional emitting systems are used that cre...

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Hlavní autoři: D. A. Antonovich, V. A. Gruzdev, V. G. Zalesski, P. N. Soldatenko
Médium: Artigo
Jazyk:Russo
Vydáno: National Academy of Sciences of Belarus 2020-10-01
Edice:Весці Нацыянальнай акадэміі навук Беларусі: Серыя фізіка-тэхнічных навук
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On-line přístup:https://vestift.belnauka.by/jour/article/view/612
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