Heterogeneous reactions in a HFCVD reactor: simulation using a 2D model
In this study, a simulation of the elementary chemical reactions during SiOx film growth in a hot filament chemical vapor deposition (HFCVD) reactor was carried out using a 2D model. For the 2D simulation, the continuity, momentum, heat, and diffusion equations were solved numerically by the softwar...
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| Hlavní autoři: | , , , , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Beilstein-Institut
2024-12-01
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| Edice: | Beilstein Journal of Nanotechnology |
| Témata: | |
| On-line přístup: | https://doi.org/10.3762/bjnano.15.128 |
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