Influence of the Incorporation of Nd in ZnO Films Grown by the HFCVD Technique to Enhance Photoluminiscence Due to Defects

In this work, optical–structural and morphological behavior when Nd is incorporated into ZnO is studied. ZnO and Nd-doped ZnO (ZnO-Nd) films were deposited at 900 °C on Silicon n-type substrates (100) by using the Hot Filament Chemical Vapor Deposition (HFCVD) technique. For this, pellets were made...

Descrición completa

Detalles Bibliográficos

Principais autores:	Marcos Palacios Bonilla, Godofredo García Salgado, Antonio Coyopol Solís, Román Romano Trujillo, Fabiola Gabriela Nieto Caballero, Enrique Rosendo Andrés, Crisóforo Morales Ruiz, Justo Miguel Gracia Jiménez, Reina Galeazzi Isasmendi
Formato:	Artigo
Idioma:	Inglês
Publicado:	MDPI AG 2024-05-01
Series:	Crystals
Assuntos:	HFCVD silicon ZnO-Nd sea urchin
Acceso en liña:	https://www.mdpi.com/2073-4352/14/6/491
Tags:	Engadir etiqueta Sen Etiquetas, Sexa o primeiro en etiquetar este rexistro!