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A Design and Characterization of CMOS SPAD Fabricated in a 0.18-<italic>&#x03BC;</italic>m Standard Process

This article presents the design and characterization of a cost-effective single-photon avalanche diode (SPAD) implemented using a standard 180-nm CMOS process without any process modification. Proposed SPAD employs a p+/n-well junction as the multiplication region and realized in two main structure...

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Bibliografiset tiedot
Päätekijät: Woojin Jo, Hyun-Seung Choi, Byungchoul Park
Aineistotyyppi: Artigo
Kieli:Inglês
Julkaistu: IEEE 2025-01-01
Sarja:IEEE Access
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Linkit:https://ieeexplore.ieee.org/document/11261539/
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