A Design and Characterization of CMOS SPAD Fabricated in a 0.18-<italic>μ</italic>m Standard Process
This article presents the design and characterization of a cost-effective single-photon avalanche diode (SPAD) implemented using a standard 180-nm CMOS process without any process modification. Proposed SPAD employs a p+/n-well junction as the multiplication region and realized in two main structure...
Tallennettuna:
| Päätekijät: | , , |
|---|---|
| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
IEEE
2025-01-01
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| Sarja: | IEEE Access |
| Aiheet: | |
| Linkit: | https://ieeexplore.ieee.org/document/11261539/ |
| Tagit: |
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