Electric Field-Enhanced SERS Detection Using MoS₂-Coated Patterned Si Substrate with Micro-Pyramid Pits

This study utilized semiconductor processing techniques to fabricate patterned silicon (Si) substrates with arrays of inverted pyramid-shaped micro-pits by etching. Molybdenum trioxide (MoO₃) was then deposited on these patterned Si substrates using a thermal evaporation system, followed...

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Detalhes bibliográficos

Principais autores:	Tsung-Shine Ko, Hsiang-Yu Hsieh, Chi Lee, Szu-Hung Chen, Wei-Chun Chen, Wei-Lin Wang, Yang-Wei Lin, Sean Wu
Formato:	Artigo
Idioma:	Inglês
Publicado em:	MDPI AG 2024-11-01
coleção:	Nanomaterials
Assuntos:	SERS MoS<sub>2</sub> electrode molecular aggregation
Acesso em linha:	https://www.mdpi.com/2079-4991/14/22/1852
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