Electric Field-Enhanced SERS Detection Using MoS<sub>2</sub>-Coated Patterned Si Substrate with Micro-Pyramid Pits
This study utilized semiconductor processing techniques to fabricate patterned silicon (Si) substrates with arrays of inverted pyramid-shaped micro-pits by etching. Molybdenum trioxide (MoO<sub>3</sub>) was then deposited on these patterned Si substrates using a thermal evaporation system, followed...
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| Autors principals: | , , , , , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI AG
2024-11-01
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| Col·lecció: | Nanomaterials |
| Matèries: | |
| Accés en línia: | https://www.mdpi.com/2079-4991/14/22/1852 |
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