Characterization of Electrodeposited Ni and Ni-Mo Thin Films by X-ray Diffraction
Electrodeposited Ni and Ni-Mo films were investigated by X-ray diffraction (XRD) and electron probe microanalysis (EPMA). Using a Williamson-Hall technique by X-ray diffraction, the Ni thin film, which shows four Bragg diffraction peaks in the XRD chart, is estimated to have a mean grain size of 30...
Guardat en:
| Autor principal: | |
|---|---|
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Elsevier
2014-11-01
|
| Col·lecció: | International Journal of Electrochemical Science |
| Matèries: | |
| Accés en línia: | http://www.sciencedirect.com/science/article/pii/S1452398123108674 |
| Etiquetes: |
Sense etiquetes, Sigues el primer a etiquetar aquest registre!
|