Characterization of Electrodeposited Ni and Ni-Mo Thin Films by X-ray Diffraction
Electrodeposited Ni and Ni-Mo films were investigated by X-ray diffraction (XRD) and electron probe microanalysis (EPMA). Using a Williamson-Hall technique by X-ray diffraction, the Ni thin film, which shows four Bragg diffraction peaks in the XRD chart, is estimated to have a mean grain size of 30...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Elsevier
2014-11-01
|
| Schriftenreihe: | International Journal of Electrochemical Science |
| Schlagworte: | |
| Online-Zugang: | http://www.sciencedirect.com/science/article/pii/S1452398123108674 |
| Tags: |
Keine Tags, Fügen Sie das erste Tag hinzu!
|