Study of Iridium (Ir) Thin Films Deposited on to SiO2 Substrates
Very smooth thin films of iridium have been deposited on super polished fused silica (SiO2) substrates using dc magnetron sputtering in argon plasma. The influence of deposition process parameters on film micro roughness has been investigated. In addition, film optical constants have been determined...
Wedi'i Gadw mewn:
| Fformat: | Artigo |
|---|---|
| Iaith: | Inglês |
| Cyhoeddwyd: |
University of Tehran
2005-06-01
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| Cyfres: | Journal of Sciences, Islamic Republic of Iran |
| Mynediad Ar-lein: | https://jsciences.ut.ac.ir/article_31648_f59d8b255c25f83e4076465fea8aec42.pdf |
| Tagiau: |
Dim Tagiau, Byddwch y cyntaf i dagio'r cofnod hwn!
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