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Epitaxial growth of silicene on ultra-thin Ag(111) films

Epitaxial growth of silicene on atomically flat ultra-thin Ag(111) films was investigated using scanning tunneling microscopy. The Ag films were prepared by low-temperature deposition of Ag on Si substrates, followed by soft annealing at room temperature. Patchy 4 × 4, √13 × √13, √7 × √7, and 2√3 × ...

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Autori principali: Junki Sone, Tsuyoshi Yamagami, Yuki Aoki, Kan Nakatsuji, Hiroyuki Hirayama
Natura: Artigo
Lingua:Inglês
Pubblicazione: IOP Publishing 2014-01-01
Serie:New Journal of Physics
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Accesso online:https://doi.org/10.1088/1367-2630/16/9/095004
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