Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties

Al2O3 layers were deposited onto electrodes by atomic layer deposition. Solubility and electron-transport blocking were tested. Films deposited onto fluorine-doped tin oxide (FTO, F:SnO2/glass) substrates blocked electron transfer to redox couples (ferricyanide/ferrocyanide) in aqueous media. Howeve...

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Bibliografske podrobnosti

Principais autores:	Hana Krýsová, Michael Neumann-Spallart, Hana Tarábková, Pavel Janda, Ladislav Kavan, Josef Krýsa
Format:	Artigo
Jezik:	Inglês
Izdano:	Beilstein-Institut 2021-01-01
Serija:	Beilstein Journal of Nanotechnology
Teme:	al2o3 atomic layer deposition (ald) barrier properties corrosion electrochemistry fto
Online dostop:	https://doi.org/10.3762/bjnano.12.2
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