Atomic layer deposited films of Al2O3 on fluorine-doped tin oxide electrodes: stability and barrier properties
Al2O3 layers were deposited onto electrodes by atomic layer deposition. Solubility and electron-transport blocking were tested. Films deposited onto fluorine-doped tin oxide (FTO, F:SnO2/glass) substrates blocked electron transfer to redox couples (ferricyanide/ferrocyanide) in aqueous media. Howeve...
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| Asıl Yazarlar: | , , , , , |
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| Materyal Türü: | Artigo |
| Dil: | Inglês |
| Baskı/Yayın Bilgisi: |
Beilstein-Institut
2021-01-01
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| Seri Bilgileri: | Beilstein Journal of Nanotechnology |
| Konular: | |
| Online Erişim: | https://doi.org/10.3762/bjnano.12.2 |
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