ANNEALING EFFECT ON VIBRATION MODES OF ALUMINUM NITRIDE THIN FILMS
Reactive magnetron sputtering was used to prepare aluminum nitride (AlN) films at an intermediate substrate temperature of 450 ºC. In order to analyze the microstructure and vibrational phonon modes of AlxNy and AlmOn clusters, the sample was subjected to thermal annealing in a controlled nitrogen a...
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| Hauptverfasser: | , , |
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| Format: | Artigo |
| Sprache: | Inglês |
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Universidad Nacional de Colombia
2014-01-01
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| Schriftenreihe: | Momento |
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| Online-Zugang: | https://revistas.unal.edu.co/index.php/momento/article/view/48041 |
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