Chlorine oxide radical (ClO·) enables the enhanced degradation of antibiotic resistance genes during UV/chlorine treatment by selectively inducing base damage

Compared to individual UV or chlorine disinfection, the combined UV and chlorine (i.e., UV/chlorine) can substantially promote the degradation of antibiotic resistance genes (ARGs) in the effluent by generating radicals. However, the mechanisms of ARG degradation induced by radicals during UV/chlori...

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Autores principales:	Mu-Cen Yao, Xin Zhang, Qi Huang, Jie Huang, Guo-Ping Sheng
Formato:	Artigo
Lenguaje:	Inglês
Publicado:	Elsevier 2023-08-01
Colección:	Environment International
Materias:	Antibiotic resistance genes (ARGs) Base damage Chlorine oxide radical (ClO·) FT-ICR mass spectrometry UV/chlorine
Acceso en línea:	http://www.sciencedirect.com/science/article/pii/S016041202300394X
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