Interfacial Interactions during Demolding in Nanoimprint Lithography
Nanoimprint lithography (NIL) is a useful technique for the fabrication of nano/micro-structured materials. This article reviews NIL in the field of demolding processes and is divided into four parts. The first part introduces the NIL technologies for pattern replication with polymer resists (e.g.,...
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| Hlavní autoři: | , , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
MDPI AG
2021-03-01
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| Edice: | Micromachines |
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| On-line přístup: | https://www.mdpi.com/2072-666X/12/4/349 |
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