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Interfacial Interactions during Demolding in Nanoimprint Lithography

Nanoimprint lithography (NIL) is a useful technique for the fabrication of nano/micro-structured materials. This article reviews NIL in the field of demolding processes and is divided into four parts. The first part introduces the NIL technologies for pattern replication with polymer resists (e.g.,...

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Autori principali: Mingjie Li, Yulong Chen, Wenxin Luo, Xing Cheng
Natura: Artigo
Lingua:Inglês
Pubblicazione: MDPI AG 2021-03-01
Serie:Micromachines
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Accesso online:https://www.mdpi.com/2072-666X/12/4/349
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