DMD-based adaptive lithography system for real-time substrate deformation compensation

This article presents a novel DMD-based adaptive lithography system enabling real-time compensation for substrate deformation during patterning. The system integrates conventional DMD lithography with optical measurement capabilities to quantify substrate deformation and dynamically adjust patterns...

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Váldodahkkit:	Jinsu Choi, Won-Sup Lee, Geehong Kim, Hyunmin Cho, Won Seok Chang, Hongki Yoo
Materiálatiipa:	Artigo
Giella:	Inglês
Almmustuhtton:	Taylor & Francis Group 2026-12-01
Ráidu:	International Journal of Optomechatronics
Fáttát:	Digital micromirror device (DMD) maskless lithography substrate deformation compensation roll-to-roll manufacturing wafer-level packaging
Liŋkkat:	https://www.tandfonline.com/doi/10.1080/15599612.2026.2635849
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