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DMD-based adaptive lithography system for real-time substrate deformation compensation

This article presents a novel DMD-based adaptive lithography system enabling real-time compensation for substrate deformation during patterning. The system integrates conventional DMD lithography with optical measurement capabilities to quantify substrate deformation and dynamically adjust patterns...

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Hoofdauteurs: Jinsu Choi, Won-Sup Lee, Geehong Kim, Hyunmin Cho, Won Seok Chang, Hongki Yoo
Formaat: Artigo
Taal:Inglês
Gepubliceerd in: Taylor & Francis Group 2026-12-01
Reeks:International Journal of Optomechatronics
Onderwerpen:
Digital micromirror device (DMD)
maskless lithography
substrate deformation compensation
roll-to-roll manufacturing
wafer-level packaging
Online toegang:https://www.tandfonline.com/doi/10.1080/15599612.2026.2635849
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