Effect of Bias Voltage on the Crystal Growth of AlN(002) Thin Films Fabricated by Reactive Magnetron Sputtering
The study investigates the influence of bias voltage on the structural and morphological properties of aluminum nitride AlN (002) thin films deposited on sapphire substrates via reactive magnetron sputtering for high-frequency surface acoustic wave (SAW) devices. The results indicate that applying a...
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| Główni autorzy: | , , , |
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| Format: | Artigo |
| Język: | Inglês |
| Wydane: |
MDPI AG
2025-09-01
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| Seria: | Micromachines |
| Hasła przedmiotowe: | |
| Dostęp online: | https://www.mdpi.com/2072-666X/16/9/1027 |
| Etykiety: |
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