Growth and Physical Structure of Amorphous Boron Carbide Deposited by Magnetron Sputtering on a Silicon Substrate with a Titanium Interlayer

Multilayer amorphous boron carbide coatings were produced by radiofrequency magnetron sputtering on silicon substrates. To improve the adhesion, titanium interlayers with different thickness were interposed between the substrate and the coating. Above three hundreds nanometer, the enhanced roughness...

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Autors principals:	Roberto Caniello, Espedito Vassallo, Anna Cremona, Giovanni Grosso, David Dellasega, Maurizio Canetti, Enrico Miorin
Format:	Artigo
Idioma:	Inglês
Publicat:	CTU Central Library 2013-01-01
Col·lecció:	Acta Polytechnica
Matèries:	boron carbide magnetron sputtering titanium interlayer scratch test.
Accés en línia:	https://ojs.cvut.cz/ojs/index.php/ap/article/view/1729
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