Characterization of Tungsten Sputtering Processes in a Capacitively Coupled Argon Plasma
A capacitively coupled radio-frequency argon plasma, used for tungsten sputtering deposition, is characterized using Langmuir probe measurements. Druyvesteyn’s method is used to evaluate plasma parameters through the integral of the Electron Energy Distribution Function (EEDF). In the pressure range...
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| 主要な著者: | , , , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
MDPI AG
2025-02-01
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| シリーズ: | Plasma |
| 主題: | |
| オンライン･アクセス: | https://www.mdpi.com/2571-6182/8/1/8 |
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