A Review on Reactor Design and Surface Modification of Atomic Layer Deposition for Functional Nanoparticles

Abstract Atomic layer deposition (ALD) has emerged as a promising method for surface modification of functional nanoparticles, enabling the versatile applications in energy, catalysis, and human health. The self‐limiting surface chemistry of ALD allows not only the coating of ultrathin and conformal...

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Principais autores:	Guanghui Yan, Gaoshan Huang, Jianjun Shi, Yi Ouyang, Xueqin Zuo, Zhihao Bao, Yongfeng Mei
Format:	Artigo
Jezik:	Inglês
Izdano:	Wiley-VCH 2025-07-01
Serija:	Advanced Materials Interfaces
Teme:	atmospheric pressure atomic layer deposition functional nanoparticle spatial atomic layer deposition surface modification
Online dostop:	https://doi.org/10.1002/admi.202500140
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