A Review on Reactor Design and Surface Modification of Atomic Layer Deposition for Functional Nanoparticles
Abstract Atomic layer deposition (ALD) has emerged as a promising method for surface modification of functional nanoparticles, enabling the versatile applications in energy, catalysis, and human health. The self‐limiting surface chemistry of ALD allows not only the coating of ultrathin and conformal...
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| Principais autores: | , , , , , , |
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| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
Wiley-VCH
2025-07-01
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| Serier: | Advanced Materials Interfaces |
| Fag: | |
| Online adgang: | https://doi.org/10.1002/admi.202500140 |
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