Formation of Cu, Ag and Au nanofiims under the influence of hydrogen atoms
Due to their electrical properties, thin metallic films are widely used in modern micro- and nanoelectronics. These properties allow solving fundamental problems of surface and solid state physics. Up-to-date methods of producing thin films involve high vacuum or multi-stage processes, which calls f...
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| Glavni autori: | , |
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| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
Politehperiodika
2015-12-01
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| Serija: | Tekhnologiya i Konstruirovanie v Elektronnoi Apparature |
| Teme: | |
| Online pristup: | https://tkea.com.ua/index.php/journal/article/view/263 |
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