Optical properties of TiO2 thin films prepared by reactive d.c. magnetron sputtering
TiO2 thin films were deposited by reactive d.c magnetron sputtering method on a glass substrate with various ratio of gas flow (Oxygen /Argon) (50/50, 100/50 and 150/50) at substrate temperature 573K. It can be observe that the optical energy gap of TiO2 thin films dependent on the ratio of gas flo...
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| Formatua: | Artigo |
| Hizkuntza: | Inglês |
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University of Baghdad
2012-10-01
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| Saila: | Iraqi Journal of Physics |
| Gaiak: | |
| Sarrera elektronikoa: | https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/749 |
| Etiketak: |
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