Optical properties of TiO2 thin films prepared by reactive d.c. magnetron sputtering
TiO2 thin films were deposited by reactive d.c magnetron sputtering method on a glass substrate with various ratio of gas flow (Oxygen /Argon) (50/50, 100/50 and 150/50) at substrate temperature 573K. It can be observe that the optical energy gap of TiO2 thin films dependent on the ratio of gas flo...
Salvato in:
| Autore principale: | |
|---|---|
| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
University of Baghdad
2012-10-01
|
| Serie: | Iraqi Journal of Physics |
| Soggetti: | |
| Accesso online: | https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/749 |
| Tags: |
Nessun Tag, puoi essere il primo ad aggiungerne!!
|