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Fabrication of Buried Microchannels with Almost Circular Cross-Section Using HNA Wet Etching

In this paper, a novel fabrication process for the realization of large, suspended microfluidic channels is presented. The method is based on Buried Channel Technology and uses a mixture of HF, HNO<sub>3</sub>, and water etchant, which has high selectivity between the silicon substrate and the silic...

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Autori principali: Qihui Yu, Henk-Willem Veltkamp, Remco J. Wiegerink, Joost C. Lötters
Natura: Artigo
Lingua:Inglês
Pubblicazione: MDPI AG 2024-09-01
Serie:Micromachines
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Accesso online:https://www.mdpi.com/2072-666X/15/10/1230
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