Influence of O<sub>2</sub> Flow Rate on the Properties of Ga<sub>2</sub>O<sub>3</sub> Growth by RF Magnetron Sputtering
The influence of the O<sub>2</sub> flow rate on the properties of gallium oxide (Ga<sub>2</sub>O<sub>3</sub>) by RF magnetron sputtering was studied. X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), transmittance spectra, and photoluminescence (PL) spectra...
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| Главные авторы: | , , , , , , , |
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| Формат: | Artigo |
| Язык: | Inglês |
| Опубликовано: |
MDPI AG
2023-01-01
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| Серии: | Micromachines |
| Предметы: | |
| Online-ссылка: | https://www.mdpi.com/2072-666X/14/2/260 |
| Метки: |
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