High aspect ratio silicon ring-shape micropillars fabricated by deep reactive ion etching with sacrificial structures
This paper presents the fabrication of widely-spaced high aspect ratio ring-shape pillars (i.e. hollow pillars). Lateral etching of the pillars during deep reactive ion etching is challenging. To reduce this problem, we proposed adding sacrificial structures surrounding the pillars such that the lat...
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| 主要な著者: | , , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Elsevier
2024-03-01
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| シリーズ: | Micro and Nano Engineering |
| 主題: | |
| オンライン･アクセス: | http://www.sciencedirect.com/science/article/pii/S2590007223000643 |
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