Monitoring Surface Stoichiometry, Work Function and Valance Band of Tungsten Oxide (WO<sub>3</sub>), Molybdenum Oxide (MoO<sub>3</sub>) and Tin Oxide (SnO<sub>2</sub>) Thin Films as a Function of Temperature and Oxygen Partial Pressure with Advanced Surface Sensitive Techniques for Chemical Sensing Applications
Atomic layer deposition (ALD) is a chemical vapor deposition (CVD) deposition method in<br />which high-quality [...]
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| Hoofdauteurs: | , , , , , |
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| Formaat: | Artigo |
| Taal: | Inglês |
| Gepubliceerd in: |
MDPI AG
2019-06-01
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| Reeks: | Proceedings |
| Onderwerpen: | |
| Online toegang: | https://www.mdpi.com/2504-3900/14/1/27 |
| Tags: |
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