Temperature dependent optical constants for SiO2 film on Si substrate by ellipsometry
In situ ellipsometry measurements in the spectra range from 246 to 1000 nm were performed on a SiO _2 /Si system at temperatures varying from 25 to 600 °C. By using Cauchy dispersion model to describe SiO _2 layer and B-spline to parameterize Si substrate, the temperature dependent optical constants...
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| Huvudupphov: | , , , , , |
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| Materialtyp: | Artigo |
| Språk: | Inglês |
| Utgiven: |
IOP Publishing
2017-01-01
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| Serie: | Materials Research Express |
| Ämnen: | |
| Länkar: | https://doi.org/10.1088/2053-1591/aa7d17 |
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