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Simulation of Magnetorheological Plane Polishing Scratch Creation Process and Suppression Method

This study was conducted to simulate the causes of, and suppress, the scratch damage on the workpiece surface during magnetorheological surface polishing. The molecular dynamics method combined with polishing contact trajectory modeling was used to simulate the scratch damage formation process, and...

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Bibliografische gegevens
Hoofdauteurs: Meixuan Wang, Meng Nie, Yueming Liu, Haodong Guo
Formaat: Artigo
Taal:Inglês
Gepubliceerd in: MDPI AG 2022-09-01
Reeks:Machines
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Online toegang:https://www.mdpi.com/2075-1702/10/9/812
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