Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction

Abstract Two novel ruthenium complexes belonging to the Ru(II)(DAD)(Cym) (DAD = diazadienyl) (Cym = cymene) compound family are introduced as promising precursors. Their chemical nature, potential for chemical vapor deposition (CVD), and possibly atomic layer deposition (ALD) are demonstrated. The d...

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Detalhes bibliográficos

Principais autores:	David Zanders, Jorit Obenlüneschloß, Jan‐Lucas Wree, Julia Jagosz, Parmish Kaur, Nils Boysen, Detlef Rogalla, Aleksander Kostka, Claudia Bock, Denis Öhl, Michael Gock, Wolfgang Schuhmann, Anjana Devi
Formato:	Artigo
Idioma:	Inglês
Publicado em:	Wiley-VCH 2022-12-01
coleção:	Advanced Materials Interfaces
Assuntos:	chemical vapor deposition (CVD) oxygen evolution reaction precursors ruthenium thin films resistivity
Acesso em linha:	https://doi.org/10.1002/admi.202201709
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