Analytical and Physical Investigation on Source Resistance in In<i><sub>x</sub></i>Ga<i><sub>1−x</sub></i>As Quantum-Well High-Electron-Mobility Transistors
We present a fully analytical model and physical investigation on the source resistance (<i>R<sub>S</sub></i>) in In<i><sub>x</sub></i>Ga<i><sub>1−x</sub></i>As quantum-well high-electron mobility transistors based on a three-layer TLM system. The <i>R<sub>S</sub></i> model in this work was derived...
Sábháilte in:
| Príomhchruthaitheoirí: | , , , , , , |
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| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe / Cruthaithe: |
MDPI AG
2023-02-01
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| Sraith: | Micromachines |
| Ábhair: | |
| Rochtain ar líne: | https://www.mdpi.com/2072-666X/14/2/439 |
| Clibeanna: |
Níl clibeanna ann, Bí ar an gcéad duine le clib a chur leis an taifead seo!
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