Effect of the Substrate Biasing on the Structure and Properties of Tantalum Coatings Deposited Using HiPIMS in Deep Oscillations Magnetron Sputtering Mode
The influence of energetic ion bombardment on the properties of tantalum coatings was studied. To achieve such energetic ion bombardment during the deposition process of tantalum coatings, a combination of deep oscillation magnetron sputtering (DOMS), an ionized physical vapour deposition technique,...
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| Autors principals: | , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI AG
2020-12-01
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| Col·lecció: | Metals |
| Matèries: | |
| Accés en línia: | https://www.mdpi.com/2075-4701/10/12/1618 |
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