Tip-based nanofabrication below 40 nm combined with a nanopositioning machine with a movement range of Ø100 mm

In this paper, the combination of an advanced nanopositioning technique and a tip-based system, which can be used as an atomic force microscope (AFM) and especially for field emission scanning probe lithography (FESPL) is presented. This is possible through the use of active microcantilevers that al...

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Autors principals:	Jaqueline Stauffenberg, Michael Reibe, Anja Krötschl, Christoph Reuter, Ingo Ortlepp, Denis Dontsov, Steffen Hesse, Ivo W. Rangelow, Steffen Strehle, Eberhard Manske
Format:	Artigo
Idioma:	Inglês
Publicat:	Elsevier 2023-06-01
Col·lecció:	Micro and Nano Engineering
Matèries:	Nanopositioning technology Field emission scanning probe lithography Tip-based nanofabrication Large working areas
Accés en línia:	http://www.sciencedirect.com/science/article/pii/S259000722300031X
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