Deep-Ultraviolet Beam Homogenizers: Phase-Modulated Metalens vs. Space-Modulated Chromium Thin-Film
Deep-ultraviolet (DUV, 193 nm) tools for lithography and precision micromachining are often limited by beam-profile nonuniformity, which degrades critical-dimension control, line-edge roughness, and process windows. Conventional phase-dependent homogenizers can lose performance under realistic phase...
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| Váldodahkkit: | , , , , , , , |
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| Materiálatiipa: | Artigo |
| Giella: | Inglês |
| Almmustuhtton: |
MDPI AG
2025-12-01
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| Ráidu: | Photonics |
| Fáttát: | |
| Liŋkkat: | https://www.mdpi.com/2304-6732/12/12/1192 |
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