Deep-Ultraviolet Beam Homogenizers: Phase-Modulated Metalens vs. Space-Modulated Chromium Thin-Film

Deep-ultraviolet (DUV, 193 nm) tools for lithography and precision micromachining are often limited by beam-profile nonuniformity, which degrades critical-dimension control, line-edge roughness, and process windows. Conventional phase-dependent homogenizers can lose performance under realistic phase...

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Principais autores:	Changtong Li, Zhaoying Qin, Junhong Li, Duanqi Ma, Shubo Cheng, Guojun Xia, Xiaoming Chen, Hsiang-Chen Chui
格式:	Artigo
語言:	Inglês
出版:	MDPI AG 2025-12-01
叢編:	Photonics
主題:	deep-ultraviolet beam homogenization metalens flat-top beam
在線閱讀:	https://www.mdpi.com/2304-6732/12/12/1192
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