Reductive Thermal ALD of Pd and Pd2Ge From a Novel Recyclable Palladium Chloride Adduct

Abstract In this work, a new ALD process for palladium metal thin films using dichlorobis(triethylphosphine)palladium(II) (PdCl2(PEt3)2) and 1,4‐bis(trimethylsilyl)‐1,4‐dihydropyrazine ((Me3Si)2DHP) as reactants, is developed. The metal precursor is chosen based on the known reactivity of metal hali...

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Principais autores:	Anton Vihervaara, Timo Hatanpää, Mikko‐Ilmari Selänne, Kenichiro Mizohata, Mikko Ritala
格式:	Artigo
語言:	Inglês
出版:	Wiley-VCH 2025-02-01
叢編:	Advanced Materials Interfaces
主題:	atomic layer deposition palladium halide adducts palladium thin films reducing agent
在線閱讀:	https://doi.org/10.1002/admi.202400579
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